SE-P(1-5) Laser Film Engraving Machine

It is suitable for laser engraving of transparent conductive film (SnO2, AZO, ITO), amorphous silicon film system (a-Si, μc-Si), back electrode film (ZnO, AI) and other materials of thin film solar cells, as well as other thin film solar cells’ film layer engraving (chalcogenide film, metallic molybdenum Mo film, metallic nickel Ni film, cadmium telluride CdTe film).

Additional information

Equipment model

SE-P(1-5)

Effective working width

1400mmx1000mm (on request)

Repeatable positioning accuracy

±10μm/1000mm

Straightness of marking lines

±10μm/1000mm

Minimum film line width

30~60μm

Clear edge width (P4)

5~20mm

Total width of three line edge

300~500μm

Technical feature

◆Suitable lasers can be configured according to different use scenarios and process requirements

◆Non-contact air floatation working platform with automatic inlet and outlet

◆Two-dimensional separated linear motion platform, with the film side of the cell facing upwards

◆CCD automatic identification and positioning system to ensure the effect of marking (edge cleaning)

◆Unique dust extraction and collection system to ensure the cleanliness of the working environment

Contact Us

Our technicians and staff of ARGUS are at your disposal for any clarification or specific questions about our PV production equipment and for the realization of your specific solution.

Visit us

No.4 Huanglong Shan North Road,East Lake High-tech District,Wuhan,P,R,China

Email Us

zenger@sunic.com.cn

Call Us

+86-15671685368

Learn how we help our clients achieve success.

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