Chalcogenide Laser Scribing Etching Machine (P1, P2, P3 scribing and etching; P4 edge cleaning)

Suitable for universities and research units to study the process and equipment for the production of calcium titanium ore cells. For laboratory calcium titanite solar cell production process of film layer etching or removal.

Additional information

Equipment model

SE-P(X)

Effective working width

500mm×500mm (on request)

Maximum running speed

2000mm/s(P1-P3),200mm/s(P4)

Repeatable positioning accuracy

±10μm/500mm

Straightness of marking lines

±10μm/500mm

Film line width (P1-P3)

30~60μm

Clear edge width (P4)

5~20mm

Total width of three line edge

300~500μm

Laser type

Selected according to process requirements

Technical feature
◆The laser can be configured according to different use scenarios and process requirements

◆Two-dimensional, three-axis linear motor drive, film side up etching process

◆CCD visual recognition and positioning for line marking (edge clearance)

◆Customised design according to customer requirements

Contact Us

Our technicians and staff of ARGUS are at your disposal for any clarification or specific questions about our PV production equipment and for the realization of your specific solution.

Visit us

No.4 Huanglong Shan North Road,East Lake High-tech District,Wuhan,P,R,China

Email Us

zenger@sunic.com.cn

Call Us

+86-15671685368

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